Hans Mueller Memorial Award & Lecture

The Hans Mueller Memorial Award & Lecture is dedicated to Hans Mueller.

Source:  MIT Museum

Hans Mueller

Massachusetts Institute of Technology (USA)

Hans Mueller was a Swiss physicist and professor at the Massachusetts Institute of Technology (MIT) who created the Mueller matrix calculus.  His contributions to polarization optics continue to reverberate through numerous fields in optics and are the basis for many advanced ellipsometry instrumentation operations as well as mathematical analysis methods.

This Award & Lecture was established at the 10th International Conference on Spectroscopic Ellipsometry (ICSE-10) by the North American Ellipsometry Association (NAEA) in collaboration with the American Vacuum Society (AVS) Spectroscopic Ellipsometry (EL) Technical Group.

The Ellipsometry Association and AVS · EL Technical Group are seeking support to permanently fund this Award & Lecture for future ICSE meetings.


Purpose

The Hans Mueller Memorial Award & Lecture recognizes outstanding individuals for their life-time achievements in the areas of interest to the Ellipsometry Association and the AVS Technical Group, with emphasis on developments, applications, and/or dissemination or education in the fields of ellipsometry and polarimetry, or other applications that use polarization properties of light.

Nature

The Hans Mueller Memorial Award & Lecture consists of:  a commemorative plaque or certificate, stating the title of the Award, details of the ICSE event, and name of the awardee;  a monetary prize;  plus an honorary Lecture at a regular session of the ICSE meeting.  The Lecture may reflect the awardee’s life-time achievements and inspire future generations of scientists and educators in the fields of ellipsometry and polarimetry.

Eligibility & Nomination

Nominees for the Hans Mueller Memorial Award & Lecture shall have made pioneering, life-long contributions to the fields of ellipsometry and polarimetry, or to other applications that use polarization properties of light.

Nomination packages should contain a cover letter, a 2-page CV of the nominee, an up to 2-page description of the contributions to the field for which the nominee shall be considered, one or more letters of support from colleagues in the field (optional), and a complete list of the nominee’s publications and/or other relevant achievements.

Nominations and self-nominations may be submitted by anyone to the Awards Committee of the respective ICSE event.

The Chair of the Awards Committee shall inform the awardee well in advance of the ICSE meeting to allow for sufficient preparation of their Lecture.


Registry of Awardees

ICSE-10 (2025)

The ICSE-10 Hans Mueller Memorial Award was shared in equal halves by John A. Woollam and David E. Aspnes.

John A. Woollam

J.A. Woollam Co., Inc. & University of Nebraska-Lincoln (USA)

For having made pioneering, life-long contributions to the development, application, dissemination, and education in the field of spectroscopic ellipsometry.

Professor John A. Woollam is President and Founder of the J.A. Woollam Co., Inc. and George Holmes Distinguished University Professor, Professor of Physics (joint appointment), and Professor of Electrical & Computer Engineering at the University of Nebraska-Lincoln.  Prior to his tenure at the University of Nebraska-Lincoln, John directed the Cryophysics Section at NASA Lewis Research Center, and he was Visiting Scientist at the MIT’s Francis Bitter National Magnet Laboratory.  John obtained a M.S. in  Electrical Engineering from Case Western Reserve University in 1978, a Ph.D.  and M.Sc. in Solid State Physics from Michigan State University in 1967 and 1963, respectively, and a B.A. in Liberal Arts from Kenyon College.  John is a Senior Member of the Institute of Electrical and Electronic Engineers (IEEE), a Fellow of the National Academy of Inventors (NAI), Fellow of the American Physical Society (APS), and a Fellow of the American Vacuum Society (AVS).  He is the recipient of the 2012 Industrial Applications of Physics Award of the American Physical Society, the 2018 Dr. Prem S. Paul Innovator of the Year Award of the University of Nebraska-Lincoln, the 2017 R. F. Bunshah Award of the Internat. Conf. Met. Coatings and Thin Films, and he received two honorary Doctorates from Kenyon College, Gambier, OH in 2008, and Linkoping University, Sweden in 2004.  John has published over 437 refereed articles, has given over 478 society meetings presentations, received over 8,300 citations, and his h-index is 45.  John holds over 65 patents, and he is the Founder of the J.A. Woollam Foundation, which is active in support of land conservation and ICSE Conferences.  His Foundation has endowed Scholarships at UNL Teachers College, UNL Engineering College, and Kenyon College.

David E. Aspnes

North Carolina State University (USA)

For the development of fundamental theories of the linear and nonlinear optical properties of materials and thin films, and for pioneering the field of spectroscopic ellipsometry.

David Aspnes is Distinguished University Professor of Physics Emeritus at North Carolina State University.  He received BSEE and MSEE degrees from the University of Wisconsin-Madison in 1960 and 1961, and a Ph.D. in Physics from the University of Illinois Urbana/Champaign in 1965.  Following a year as a postdoctoral research associate at UIUC and another at Brown University, he joined Bell Laboratories, Murray Hill, NJ, as a Member of the Technical Staff in the Surface Physics Research Department, where his interests lay in the investigations of surfaces under ambient conditions.  In 1984 he became Head of the Interface Physics Department of the newly created Bellcore.  He joined NC State University 1992.  He is best known for his experimental and theoretical work on the development and application of optical techniques for the analysis of surfaces, interfaces, thin films, structures, and materials.  These include the theory and practice of spectroscopic ellipsometry, modulation spectroscopy, reflectance difference spectroscopy, and nonlinear optics.  Professional recognitions include fellowships in various professional societies, the R. W. Wood Prize of the Optical Society of America, the Medard W. Welch Award of the American Vacuum Society, the Mentor Award of the Society of Vacuum Coaters, election to the US National Academy of Sciences, and being named a Fellow of the National Academy of Inventors.  He has an h-index of 76, 23 patents, and over 500 publications in scientific journals.  Although retired, he remains active on graduate committees, developing methods of eliminating noise and extracting information from spectra, and writing a textbook on classical electrodynamics.

  • North American Ellipsometry Association LinkedIn Group Grows 300 Members Strong!

    🌟 Join Us in Celebrating:
    We are proud to announce that the North American Ellipsometry Association LinkedIn Group has grown to 300 members since its formation in 2023. We highly appreciate the connectedness and dedication of everyone within the ellipsometry community.
    As we celebrate this milestone, we encourage you to invite additional colleagues and peers to join this growing network and share your insights, experiences, and questions to enrich the discourse in the field. Your participation and contributions are key to our collective success.

    📢 Looking Ahead to AWE-1:
    We cordially invite you to the 1st American Workshop on Ellipsometry (AWE-1), to be held February 28 – March 3, 2027, in Lincoln, Nebraska.
    Mark your calendars and stay tuned for more information on the workshop website!

    💡 About Us:
    The North American Ellipsometry Association (NAEA) is a nonprofit organization to promote the dissemination of knowledge, education, and research in the use of optical methods that exploit the polarization properties of light to investigate broadly optical materials properties for use in advanced and widespread applications such as in semiconductor, automotive, aviation, renewables, biomedical, and health care for the betterment of humanity.

    📜 Purposes:
    The Ellipsometry Association is organized exclusively for charitable, educational, and scientific purposes within the meaning of Section 501(c)(3) of the Internal Revenue Code. Within such purposes, the specific Purposes of the Association are:
    1️⃣ To provide a forum for scientific and technical discussions on the use of optical methods which exploit the polarization properties of light, their applications to materials characterization, and their improvements through continued technological and scientific advancements.
    2️⃣ To provide continuing education through the organization and sponsorship of symposia, topical conferences, short courses, workshops, and exhibits.
    3️⃣ To promote student participation in national and local scientific and technological activities, science fairs and competitions, and other appropriate measures.
    4️⃣ To recognize excellence in science and technology through the presentation of awards.
    5️⃣ To disseminate information through the publication of topical conference proceedings, monographs, video tapes, and recommended practices.
    6️⃣ To cooperate with other societies to advance common goals fostering the growth and development of intellectual resources in science and engineering disciplines.

  • AVS 72 · Spectroscopic Ellipsometry (EL) – Call for Abstracts

    Dear colleagues,

    In collaboration with the North American Ellipsometry Association,
    the AVS 72 · EL – Call for Abstracts is now open.

    American Vacuum Society (AVS) 72nd International Symposium & Exhibition
    Spectroscopic Ellipsometry (EL) Technical Group

    📢 Submit your abstract before May 18, 2026, and select EL sessions!
    Please circulate this AVS 72 · EL – Call for Abstracts with your professional networks!

    🧑‍🏫 EL1:  Spectroscopic Ellipsometry  (Oral Session)
    🧑‍🏫 EL2:  In-Situ Ellipsometry for Atomic Scale Processing  (Oral Session)
    This session will be part of the Atomic Scale Processing (AP) Mini Symposium, in collaboration with the Thin Film (TF), Plasma Science & Technology (PS), Electronics Materials & Photonics (EM) Divisions, and Spectroscopic Ellipsometry (EL) Technical Group.
    📃 EL3:  Spectroscopic Ellipsometry  (Poster Session)

    The Program of the Spectroscopic Ellipsometry (EL) Technical Group covers ellipsometry as an optical, polarization-resolved metrology technique to study & understand materials, thin films, and interface systems across fabrication, characterization, and application-driven research. Abstracts must emphasize how ellipsometry provides quantitative access to optical, electronic, and/or structural properties or reveals direct connections between optical response, material growth, and/or functional performance. Highlights include advances in ellipsometry instrumentation & analysis methods that improve sensitivity or offer novel insights across a range of studies, including atomic-scale thin-film evolution, interface processes, photochromic transitions, complex anisotropic systems, or optical chirality of spatially heterogeneous nanostructures. The EL Program will further encompass real-time growth monitoring, detailed optical modeling, emerging application spaces, etc., to reflect the evolving role of ellipsometry as an enabling platform for modern materials science & engineering.

    We look forward to seeing you November 8-13, 2026, in Pittsburgh, Pennsylvania!

    Best regards,
    UFUK, Andy, Nik, Mathias, Marcel
    AVS 72 · EL Program Committee